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Chemical Mechanical Polishing (CMP) Sludge Recycling Technology Solution

Chemical Mechanical Polishing (CMP) Sludge Recycling Technology Solution

(1) Technical Principle CMP sludge consists mainly of silica and aluminum oxide, with some containing small amounts of copper. This technology processes the sludge through drying, calcination, leaching, water washing, and extraction to produce Semic Silica (mineral powder) and copper sulfate solution.

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Product Information

(2) Product Applications

Product Name

Applications

Semic Silica

Filler for rubber, plastics, or textiles; refractory or insulation materials; construction raw materials; coatings

Copper Sulfate Solution

Industrial-grade copper sulfate or electrolytic copper raw material

Product Information

(2) Product Applications

Product Name

Applications

Semic Silica

Filler for rubber, plastics, or textiles; refractory or insulation materials; construction raw materials; coatings

Copper Sulfate Solution

Industrial-grade copper sulfate or electrolytic copper raw material

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